| 摘要 |
The present invention is a self-organization composition for pattern formation comprising a block copolymer [A] containing a polystyrene block having styrene units and a polyalkyl(meth)acrylate block having alkyl(meth)acrylate units, the self-organization composition for pattern formation being characterized in that the block copolymer [A] has groups (±) that are bonded to at least one terminus of the main chain and that contain hetero atoms. The hetero atoms are preferably at least one type selected from a group of oxygen, nitrogen, sulfur, phosphorus, tin, and silicon atoms. |
