| 摘要 |
<p>The present invention refers to the construction of a device for the physical deposit of vapors. The process is produced by the interaction of five subsystems. The evolution of the parameters of each subsystem as well as its control is performed by communication protocols through serial ports. The physical deposit of vapors is produced in a vacuum chamber by the suitable interaction of each one of the subsystems. Described is the interaction of the following subsystems: 1. Subsystem for the gas supply: 2. Subsystem for controlling the conductance; 3. Subsystem for controlling the power transport; 4. Subsystem for transporting the parameter measure; 5. Heating module. The document includes in a detailed manner the elements that form each subsystem as well as the interaction modes between subsystems. The development considers special and original elements for the production of fine films for coating pieces, such as the dynamic measure of the pressure and its affectation by means of a va lve controlled in a dynamic manner following a process from a control resource by computer, also the transport of power for generating plasma, and resources for the track and the dynamic control of process parameters. In addition, the sequence of the nitriding treatment of steel for subsequently performing the coating of the piece in the same device provides originality to the invention.</p> |
