发明名称 Quaternary ammonium hydroxides
摘要 A method of removing a residue from a surface, including applying to the surface a composition including (a) a quaternary ammonium hydroxide having a general formula (I):; as defined herein, and (b) a dipolar aprotic solvent substantially free of water; andremoving at least a substantial portion of the residue from the surface.
申请公布号 US9090859(B2) 申请公布日期 2015.07.28
申请号 US201213430985 申请日期 2012.03.27
申请人 Sachem, Inc. 发明人 Little Charles B.
分类号 C11D7/50;C07C217/28;C11D3/28;C11D3/30;C11D3/43;C11D7/32;C11D1/62 主分类号 C11D7/50
代理机构 Renner, Otto, Boisselle & Sklar, LLP 代理人 Renner, Otto, Boisselle & Sklar, LLP
主权项 1. A method of removing a residue from a surface, comprising: applying to the surface a composition comprising: (a) a quaternary ammonium hydroxide having a general formula (I): wherein in the general formula (I): R1 may be C1-C18 linear or branched alkyl, C2-C18 linear or branched alkanol, C3-C18 linear or branched polyol, benzyl, or substituted benzyl, wherein when present, substituted benzyl is substituted with one or more of C1-C4 alkyl, C1-C4 alkoxy, or halogen, or R1 may have the following general formulae (i) or (ii): wherein in general formulae (i) and (ii), R6 is independently C1-C4 branched or unbranched alkyl; R2 and R3 may be independently C1-C18 linear or branched alkyl, C2-C18 linear or branched alkanol, C3-C18 linear or branched polyol, benzyl, or substituted benzyl, wherein when present, substituted benzyl is substituted with one or more of C1-C4 alkyl, C1-C4 alkoxy, or halogen, orR1 is as defined above, and R2 and R3 may together form a heterocyclic ring containing the quaternary ammonium N atom of the general formula (I) and 4 to 7 carbon atoms, orR1 is as defined above, and R2 and R3 may together form a heterocyclic ring containing the quaternary ammonium nitrogen atom of the general formula (I), and either a second nitrogen atom or an oxygen atom and 3 to 6 carbon atoms, wherein the second nitrogen atom may be substituted with one or two groups independently selected from C1-C18 linear or branched alkyl, C2-C18 linear or branched alkanol, C3-C18 linear or branched polyol, benzyl, or substituted benzyl, wherein when present, substituted benzyl is substituted with one or more of C1-C4 alkyl, C1-C4 alkoxy, or halogen, orR1, R2, and R3 together may form a bicyclic structure containing from two to four carbon atoms between first and second bridgehead positions, wherein the quaternary N atom of the general formula (I) is at the first bridgehead position, and a carbon or a tertiary or quaternary nitrogen is at the second bridgehead position, wherein when the second bridgehead position is a carbon or a quaternary nitrogen, the carbon or quaternary nitrogen is substituted with R5, in which R5 is H or a C1-C4 branched or unbranched alkyl group, andR4 is C1-C18 linear or branched alkyl, phenyl or substituted phenyl, or benzyl or substituted benzyl, wherein when present, substituted phenyl or substituted benzyl is substituted with one or more of C1-C4 alkyl, C1-C4 alkoxy, or halogen; and (b) a dipolar aprotic solvent substantially free of water; and removing at least a substantial portion of the residue from the surface.
地址 Austin TX US