发明名称 |
APPARATUS AND METHOD FOR MEASURING COUPLING DELAY OF THROUGH SUBSTRATE VIA |
摘要 |
<p>The present invention relates to an apparatus and a method for measuring interference delay of a through an electrode. According to the present invention, the apparatus thereof is capable of measuring interference delay of through electrodes for transmitting a signal between stacked dies of a three dimensional semiconductor. Provided is the apparatus for measuring interference delay of a through electrode comprising: a chain generation part to divide through electrodes into a plurality of groups based on a first through electrode determined among the through electrodes, and to connect the through electrodes in each of a plurality of groups by a chain structure; and an interference delay measurement part to measure the sub-interference delay time between the through electrodes connected by the chain structure by each of a plurality of groups, and to measure the interference delay time of the through electrodes by using the sub-interference delay time measured by each of a plurality of groups.</p> |
申请公布号 |
KR101539715(B1) |
申请公布日期 |
2015.07.28 |
申请号 |
KR20150008531 |
申请日期 |
2015.01.19 |
申请人 |
INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY |
发明人 |
KANG, SUNG HO;JANG, JAE WON |
分类号 |
G01R31/317 |
主分类号 |
G01R31/317 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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