| 摘要 |
PROBLEM TO BE SOLVED: To provide a glass substrate achieving both of high strain point and prevention of dissolution tank erosion, a glass substrate achieving both of high strain point and control of loss of clarity, or a glass substrate achieving both of high strain point and high etching rate, and a manufacturing method therefor.SOLUTION: A glass substrate for display consists of glass containing SiO, AlOand MgO with MgO/(RO+ZnO), where RO represents (MgO+CaO+SrO+BaO), of 0.1 to 0.9 in mol% and having strain point of 700°C or more. A thermal shrinkage represented by the following formula is 5 ppm to 75 ppm when increasing temperature with temperature rising speed of 10°C/min., holding at 550°C for 2 hours, decreasing temperature to 400°C over 55 minutes, then allowing to cool to the room temperature. Thermal shrinkage (ppm)={shrinkage amount of the glass before and after heating treatment/glass length before heating treatment}×10. |
