PHOTORESIST OVERCOAT COMPOSITIONS

摘要

PROBLEM TO BE SOLVED: To provide overcoat compositions which allow formation of fine patterns using a negative tone development process.SOLUTION: Photoresist overcoat compositions comprise: a quenching polymer which comprises a first unit having a basic moiety and a second unit formed from a specific monomer; and an organic solvent. The quenching polymer is present in the composition in an amount of 80 to 100 wt.% based on total solids of the overcoat composition.