发明名称 PHOTOSENSITIVE RESIN COMPOSITION AND PHOTOSENSITIVE RESIN PRINTING PLATE ORIGINAL
摘要 [Problem] To provide a photosensitive resin composition which exhibits excellent relief image reproducibility and improved toughness and printing durability, and a photosensitive resin printing plate precursor. [Solution] A photosensitive resin composition which is characterized by containing (A) a modified and partially saponified poly(vinyl acetate) having a reactive group in a side chain, (B) a polyamide having a basic nitrogen atom, (C) a compound having a molecular weight of 300 or lower, a 5-7 membered ring and a polymerizable ethylenic double bond, and (D) a photopolymerization initiator.
申请公布号 US2015205201(A1) 申请公布日期 2015.07.23
申请号 US201314418710 申请日期 2013.07.30
申请人 TORAY INDUSTRIES, INC. 发明人 Abura Tsutomu;Yabuki Shuhei
分类号 G03F7/031;G03F7/32 主分类号 G03F7/031
代理机构 代理人
主权项
地址 Tokyo JP