发明名称 |
SULFUR-MODIFIED CHLOROPRENE RUBBER COMPOSITION AND MOLDED BODY |
摘要 |
An object of the invention is to provide a sulfur-modified chloroprene rubber composition improved in heat resistance. A sulfur-modified chloroprene rubber composition, comprising a sulfur-modified chloroprene rubber containing sulfur chemically bound thereto and sulfur not chemically bound to the sulfur-modified chloroprene rubber, wherein: the ratio of the amount of sulfur chemically bound to the sulfur-modified chloroprene rubber to the total amount of sulfur in the sulfur-modified chloroprene rubber composition (amount of chemically bound sulfur [mass %]/total amount of sulfur [mass %]) is 0.1 to 0.45; and the sulfur-modified chloroprene rubber has, at the molecular terminal, at least one structure represented by the following General Formula (1) or (2): —S—C(═S)—O—R1 . . . (1) (in General Formula (1), R1 represents an alkyl group having 1 to 4 carbon atoms) or —S—R2 . . . (2) (in General Formula (2), R2 represents an alkyl group having 8 to 20 carbon atoms). |
申请公布号 |
US2015203613(A1) |
申请公布日期 |
2015.07.23 |
申请号 |
US201314425510 |
申请日期 |
2013.09.10 |
申请人 |
DENKI KAGAKU KOGYO KABUSHIKI KAISHA |
发明人 |
Sunada Takashi;Abe Yasushi;Kobayashi Naoki |
分类号 |
C08F36/18 |
主分类号 |
C08F36/18 |
代理机构 |
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代理人 |
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主权项 |
1. A sulfur-modified chloroprene rubber composition, comprising a sulfur-modified chloroprene rubber containing sulfur chemically bound thereto and sulfur not chemically bound to the sulfur-modified chloroprene rubber, wherein:
the ratio of the amount of sulfur chemically bound to the sulfur-modified chloroprene rubber to the total amount of sulfur in the sulfur-modified chloroprene rubber composition (amount of chemically bound sulfur [mass %]/total amount of sulfur [mass %]) is 0.1 to 0.45; and the sulfur-modified chloroprene rubber has, at the molecular terminal, at least one structure represented by the following General Formula (1) or (2):
—S—C(═S)—O—R1 (1)(in General Formula (1), R1 represents an alkyl group having 1 to 4 carbon atoms) or
—S—R2 (2)(in General Formula (2), R2 represents an alkyl group having 8 to 20 carbon atoms). |
地址 |
Tokyo JP |