| 摘要 |
A method of manufacturing an image element array for a security device comprises: (a) providing a metallised substrate web comprising a substrate 10 having a first metal layer 11 thereon on a first surface of the substrate, the first metal layer being soluble in a first etchant substance; (b) applying a first photosensitive resist layer 12 to the first metal layer; (c) exposing the first photosensitive resist layer to radiation of a wavelength to which the resist layer is responsive through a patterned mask 1, whereupon exposed second pattern elements P2 of the first photosensitive resist layer react resulting in increased solubility by a second etchant substance, the non-exposed first pattern elements P1 remaining relatively insoluble by the second etchant substance; and (d) applying the first and second etchant substances to the substrate web whereupon the second pattern elements of both the first resist layer and the first metal layer are dissolved, the remaining first pattern elements of the first metal layer forming an image element array. There is also provided a security device including a focussing element array and an image element array. |
