| 摘要 |
<P>PROBLEM TO BE SOLVED: To remove a hydride of silicon from gas containing the hydride of silicon in a simpler manner than conventional ones while suppressing increase in costs. <P>SOLUTION: A gas treatment method removes the hydride of silicon from gas containing the hydride of silicon. The gas treatment method is adopted, which is characterized in that bubbles having a diameter of 10 μm or less and comprising the gas containing the hydride of silicon are brought into contact with water. <P>COPYRIGHT: (C)2013,JPO&INPIT |
