| 摘要 |
<p>The invention relates to: - a non-rough glass substrate coated with a stack of thin layers which finishes with a mixed zinc tin oxide layer having a thickness of between 15 and 60 nm, then with a silicon nitride layer having a thickness of between 20 and 100 nm, detached from place to place from said mixed oxide layer so as to form delamination blisters having a size of between of 1 and 20 nm; a process for manufacturing this substrate, comprising the operations that consist in - depositing by sputtering, especially magnetron sputtering, on a non-rough glass substrate optionally coated with at least one thin layer, a mixed zinc tin oxide layer, the oxygen content of which is lower than that completely saturating the oxidation process of these two metals simultaneously, and having a thickness of between 15 and 60 nm, then a silicon nitride layer having a thickness of between 20 and 100 nm and having an intrinsic compressive stress at least equal to 1 GPa, then in - subjecting the assembly to a heat treatment between 500 and 750 °C for 7 to 15 minutes; the application of this substrate, as transparent motor vehicle roof, façade or spandrel glass, anti-reflective low-emissivity motor vehicle roof, anti‑ reflective windscreen, low-emissivity building glazing, or projection screen.</p> |
