SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME
摘要
The present invention provides a semiconductor device and a manufacturing method thereof. The semiconductor device comprises: an activation area provided on a substrate; an inflow channel accumulated on one side of the substrate with a single common cavity; an outflow channel accumulated on another side of the substrate with a single common cavity; a microchannel array which is commonly accumulated on the substrate, of which one end is connected to a side of the inflow channel, and the other side is connected to a side of the outflow channel; and a micro heat sink array to divide the microchannels to be separated.
申请公布号
KR20150083310(A)
申请公布日期
2015.07.17
申请号
KR20140002913
申请日期
2014.01.09
申请人
ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE
发明人
JUN, CHI HOON;KO, SANG CHOON;MOON, SEOK HWAN;CHANG, WOO JIN;BAE, SUNG BUM;PARK, YOUNG RAK;NA, JE HO;MUN, JAE KYOUNG;NAM, EUN SOO