发明名称 Semiconductor Devices and Methods of Manufacture Thereof
摘要 Semiconductor devices and methods of manufacture thereof are disclosed. In one embodiment, a semiconductor device comprises a workpiece including a conductive feature disposed in a first insulating material and a second insulating material disposed over the first insulating material, the second insulating material having an opening over the conductive feature. A graphene-based conductive layer is disposed over an exposed top surface of the conductive feature within the opening in the second insulating material. A carbon-based adhesive layer is disposed over sidewalls of the opening in the second insulating material. A carbon nano-tube (CNT) is disposed within the patterned second insulating material over the graphene-based conductive layer and the carbon-based adhesive layer.
申请公布号 US2015200164(A1) 申请公布日期 2015.07.16
申请号 US201514668207 申请日期 2015.03.25
申请人 Taiwan Semiconductor Manufacturing Company, Ltd. 发明人 Yang Shin-Yi;Lee Ming-Han;Lee Hsiang-Huan;Wu Hsien-Chang
分类号 H01L23/532;H01L23/528;H01L23/522 主分类号 H01L23/532
代理机构 代理人
主权项 1. A semiconductor device, comprising: a workpiece including a conductive feature disposed in a first insulating material and a second insulating material disposed over the first insulating material, the second insulating material having an opening over the conductive feature; a graphene-based conductive layer disposed over an exposed top surface of the conductive feature within the opening in the second insulating material; a carbon-based adhesive layer disposed over sidewalls of the opening in the second insulating material; and a carbon nano-tube (CNT) disposed within the second insulating material over the graphene-based conductive layer and the carbon-based adhesive layer.
地址 Hsin-Chu TW