| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a structure which has a high wettability region and a low wettability region formed in desired parts of the same structure and resists physical external force (frictional force and the like) expected in terms of use. <P>SOLUTION: The structure includes: a base material; an amorphous carbon film, which is formed on the surface of the base material, contains silicon, or silicon and oxygen, and has a surface formed by plasma treatment using nitrogen or oxygen, or a mixture of them; and a thin film formed in a part of the plasma-treated surface by using a silane coupling agent containing fluorine. <P>COPYRIGHT: (C)2012,JPO&INPIT</p> |
