发明名称 Wet scrubber and a method of cleaning a process gas
摘要 A wet scrubber (1) useful for cleaning a process gas comprises at least a first spray level system (20) and a second spray level system (26) arranged vertically above the first spray level system (20) in a wet scrubber tower (2). The first spray level system (20) comprises at least one gas-liquid contacting plate (38) which is operative for deflecting absorption liquid, that has been atomized by means of the second spray level system (26) and flowing downward in the wet scrubber tower (2), so deflected absorption liquid (AL) may contact process gas (F) contacted by absorption liquid atomized by the first spray level system (20).
申请公布号 US9079131(B2) 申请公布日期 2015.07.14
申请号 US201113992822 申请日期 2011.11.16
申请人 ALSTOM Technology Ltd 发明人 Håkansson Rikard
分类号 B01D53/18;B01D47/06;B01D3/00;B01D53/50;F23J15/00 主分类号 B01D53/18
代理机构 代理人 Vacca Rita D.
主权项 1. A wet scrubber useful for cleaning a process gas, the wet scrubber comprising: at least a first spray level system supplied an absorption liquid for atomization by nozzles comprised in the first spray level system, a second spray level system arranged vertically above the first spray level system supplied an absorption liquid for atomization by nozzles comprised in the second spray level system, and a wet scrubber tower housing the first and second spray level systems comprising a process gas inlet located at a base portion of the tower, and a process gas outlet located at an upper portion of the tower, wherein the first spray level system comprises at least one gas-liquid contacting plate located vertically above at least one nozzle of the first spray level system, the at least one gas-liquid contacting plate operative for deflecting absorption liquid atomized by nozzles of the second spray level system flowing downward in the wet scrubber tower to contact process gas already contacted by absorption liquid atomized by the at least one nozzle of the first spray level system, and at least one adjustable damper located adjacent to the at least one gas-liquid contacting plate for controlling vertical velocity of process gas contacted by deflected absorption liquid.
地址 Baden CH