Method for measuring an angularly resolved intensity distribution and projection exposure apparatus

摘要

A method for measuring an angularly resolved intensity distribution in a reticle plane (24) of a projection exposure apparatus (10). The apparatus includes an illumination system (16), irradiating a reticle (22) arranged in the reticle plane (24) and having a first pupil plane (20). All planes of the projection exposure apparatus which are conjugate thereto are further pupil planes, and the reticle plane (24) and all planes which are conjugate thereto are field planes. The method includes: arranging a spatially resolving detection module (44) in the region of one of the field planes (24, 30) such that the detection module is at a smaller distance from this field plane than from the closest pupil plane (20), radiating electromagnetic radiation (21) onto an optical module (42) from the illumination system, and determining an angularly resolved intensity distribution of the radiation from a signal recorded by the detection module.

主权项

1. A method for measuring a beam divergence in an illumination system of a projection exposure apparatus for microlithography, wherein the illumination system has a beam expanding optical unit for expanding a beam cross section of exposure radiation from a radiation source, and a beam angle redistribution module for deflecting partial beams of the exposure radiation from the beam expanding optical unit, and the method comprises:
exchanging at least one element of the beam angle redistribution module for a divergence amplification module, which is configured for amplifying the divergence of the beam from the beam expanding optical unit, and measuring the illumination angle distribution in the reticle plane and determining a divergence of the exposure radiation from the beam expanding optical unit from the measured illumination angle distribution.