发明名称 Method and apparatus for controlling a processing system
摘要 Methods and apparatus for controlling a processing system are provided herein. In some embodiments, a method of controlling a processing system may include operating a vacuum pump coupled to a process chamber at a first baseline pump idle speed selected to maintain the process chamber at a pressure equal to a first baseline pump idle pressure; monitoring the pressure in the process chamber while operating the vacuum pump at the first baseline pump idle speed; and determining whether the first baseline pump idle pressure can be maintained in the process chamber when the vacuum pump is operating at the first baseline pump idle speed.
申请公布号 US9080576(B2) 申请公布日期 2015.07.14
申请号 US201213359899 申请日期 2012.01.27
申请人 APPLIED MATERIALS, INC. 发明人 Loldj Youssef;Jung Jay J.;Moalem Mehran;Fisher Paul E.;Putz Joshua;Neuber Andreas
分类号 F04B49/06;F04D27/00;F04D19/04;F17D3/00 主分类号 F04B49/06
代理机构 Moser Taboada 代理人 Moser Taboada ;Taboada Alan
主权项 1. A method of controlling a processing system, comprising: determining a first baseline pump idle pressure in a process chamber while a valve separating the process chamber from an exhaust line coupled to a vacuum pump is open; determining a first baseline pump idle speed, wherein the first baseline pump idle speed is equal to a lowest pump speed of the vacuum pump sufficient to maintain the first baseline pump idle pressure; operating a vacuum pump coupled to a process chamber at a first baseline pump idle speed selected to maintain the process chamber at a pressure equal to a first baseline pump idle pressure; monitoring the pressure in the process chamber while operating the vacuum pump at the first baseline pump idle speed; upon monitoring a pressure in the process chamber that is different from the first baseline pump idle pressure, adjusting the pump speed of the vacuum pump to a second baseline pump idle speed to maintain the process chamber at the first baseline pump idle pressure, wherein the second baseline pump idle speed of the vacuum pump maintains the exhaust line between the valve and the vacuum pump at a pressure equal to a second baseline pump idle pressure when the valve separating the process chamber and the exhaust line is closed; and determining whether the second pump idle speed is within a predetermined tolerance of the first baseline pump idle speed.
地址 Santa Clara CA US
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