| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of automatically generating a measuring method suitable for a plasma ion source mass analysis of an element to be measured.SOLUTION: The method includes: semi-quantitatively measuring all elements that may affect the measurement in a measurement sample; determining a plasma condition on the basis of a total concentration of the semi-quantitatively measured elements; estimating elements in the measurement sample and a signal strength of an interference component for each of the semi-quantitatively measured elements, and estimating an element concentration from the result; and, on the basis of the elements, the signal strength of the interference component, and the element concentration which are estimated, generating at least one mass analysis method including at least one of (1) the plasma condition, (2) an internal standard to be added into the measurement sample, (3) tune conditions for a collision/reaction cell, (4) a mass-to-charge ratio to be used by a mass spectrometer, and (5) an integral time to be used by the mass spectrometer. |
