发明名称 GAS BARRIER FILM AND GAS BARRIER FILM MANUFACTURING METHOD
摘要 <p>PROBLEM TO BE SOLVED: To provide a new and improved gas barrier film in which gas barrier performance can be improved while utilizing high heat resistance which polyimide has, and a gas barrier film manufacturing method.SOLUTION: According to a certain view point of the present invention, provided is a gas barrier film featuring to include solvent-soluble polyimide. According to this view point, the solvent-soluble polyimide is used and this polyimide has high transparency, heat resistance and smoothness. And, a cording to this view point, coating liquid is prepared by dissolving the solvent-soluble polyimide in a solvent, and an organic layer is formed by applying this coating liquid on a coating surface and removing the solvent only. Therefore, high energy is not needed for forming the organic layer. For this reason, heat shrinkage of the organic layer is suppressed, and, in turn, crack generation in the gas barrier layer is suppressed. Therefore, gas barrier performance of the gas barrier film is improved.</p>
申请公布号 JP2015127124(A) 申请公布日期 2015.07.09
申请号 JP20130273433 申请日期 2013.12.27
申请人 SAMSUNG ELECTRONICS CO LTD 发明人 KIKUCHI TOMOYUKI;SHIRONO TAKAFUMI
分类号 B32B15/088 主分类号 B32B15/088
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