| 摘要 |
PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition from which such a hole pattern can be formed with good dependency of a developing time, that has an ultrafine pore diameter (e.g. 60 nm or less) and superior circularity, and to provide a resist film using the composition, a pattern forming method, a method for manufacturing an electronic device, and an electronic device.SOLUTION: The actinic ray-sensitive or radiation-sensitive resin composition comprises: (P) a resin having a repeating unit (a) represented by general formula (I); and (B) a compound that generates an organic acid by irradiation with actinic rays or radiation. The content of the compound (B) with respect to the whole solid content of the actinic ray-sensitive or radiation-sensitive resin composition is 8.0 mass% or more. A resist film using the above composition, a pattern forming method, a method for manufacturing an electronic device, and an electronic device are also disclosed. In general formula (I), Rrepresents a hydrogen atom or a methyl group; and R, Rand Reach independently represent a linear or branched alkyl group. |
