发明名称 GLASS POLISHING METHOD, AND GLASS POLISHING DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To provide a glass polishing method and a glass polishing device in which sludge is not generated on a glass surface even if polishing liquid for aluminoborosilicate glass, which has hydrofluoric acid as a main component is used in circulation, and solidification of sludge in a production apparatus or piping can be avoided.SOLUTION: A method for polishing an Al-containing glass 90 by polishing liquid containing hydrofluoric acid has: a process of solidifying dissolved Al in post-use polishing liquid after polishing the glass 90 to obtain post-reaction polishing liquid; a process of performing solid-liquid separation to the post-reaction polishing liquid to obtain regenerated polishing liquid; and a process of polishing the glass 90 by the regenerated polishing liquid, in which generation of sludge on a glass surface or each part of the polishing device can be suppressed even if the polishing liquid is used in circulation by forcibly solidifying and removing an Al-F complex being a causative substance of sludge.</p>
申请公布号 JP2015127289(A) 申请公布日期 2015.07.09
申请号 JP20140091583 申请日期 2014.04.25
申请人 PANASONIC CORP;NSC:KK 发明人 SHIMADA KAZUYA;IEDA TOMOYUKI;FUKAYA YASUSHI;MIYOSHI YUZO;SHIMIZU YUTO
分类号 C03C15/00 主分类号 C03C15/00
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