CROSSLINKABLE POLYMERS AND UNDERLAYER COMPOSITIONS

摘要

In the present invention, disclosed is a crosslinkable polymer, including a first unit of (I-A) or (I-B) of general formulas; and a second unit selected from (III) and (IV) general formula where a composition on a lower layer includes the crosslinkable polymer and a solvent wherein the crosslinkable polymer and the composition on the lower layer are particularly used for manufacturing semiconductor devices or data storage devices for forming a high resolution pattern wherein a P is a polymerizable functional group; an L is single bond or a coupling group whose valence is m+1; an X1 is one valence and an electron donating group; and an X2 is divalence and an electron donating group.