| 摘要 |
<p>Provided is a substrate treating apparatus. The substrate treating apparatus includes: a drying chamber for drying a substrate by dissolving an organic solvent on the substrate with supercritical fluid; a supply unit which supplies the fluid to the drying chamber; and a reproduction unit which has a buffer tank for storing the fluid discharged from the drying chamber, separates the fluid from the organic solvent and reproduces the organic solvent, and supplies the reproduced fluid to the supply unit. The supply unit includes a condenser, a water supply tank which receives the fluid liquefied in the condenser and stores the fluid, and a pump which is installed between the condenser and the water supply tank and supplies the fluid to the water supply tank. The water supply tank may include an accumulator. Gas is supplied into the accumulator. The volume of the accumulator changes according to a relative pressure due to the fluid in the water supply tank.</p> |
