| 摘要 |
<p>Provided in the present invention is a substrate treating apparatus. The substrate treating apparatus comprises a chamber including a lower body and an upper body combined with the lower body and forming an inner space where process is treated; and a sealing assembly provided between the upper body and the lower body, and sealing the inner space from the outside, wherein the upper end of the side wall of the lower body is has the outer side higher than the inner side to protrude in an area where the upper body and the lower body contact, the sealing assembly is located in the inner area, and a groove where a fluid in the inner space can be flowed in is included on the lower end of the sealing assembly.</p> |
