发明名称 METHODS OF FORMING ELECTRICAL COMPONENTS AND MEMORY CELLS
摘要 <p>Some embodiments include methods of forming electrical components. First and second exposed surface configurations are formed over a first structure, and material is then formed across the surface configurations. The material is sub-divided amongst two or more domains, with a first of the domains being induced by the first surface configuration, and with a second of the domains being induced by the second surface configuration. A second structure is then formed over the material. The first domains of the material are incorporated into electrical components. The second domains may be replaced with dielectric material to provide isolation between adjacent electrical components, or may be utilized as intervening regions between adjacent electrical components.</p>
申请公布号 EP2636059(A4) 申请公布日期 2015.07.08
申请号 EP20110838434 申请日期 2011.10.14
申请人 MICRON TECHNOLOGY, INC. 发明人 SILLS, SCOTT, E.;MEADE, ROY, E.
分类号 H01L21/8247;H01L21/8242;H01L27/108;H01L27/115;H01L27/24;H01L45/00 主分类号 H01L21/8247
代理机构 代理人
主权项
地址