发明名称 |
Radiation source and related method |
摘要 |
<p>A radiation source (50) is configured to produce extreme ultraviolet radiation. The radiation source includes a chamber in which, in use, a plasma (P) is generated, and an evaporation surface (62) configured to evaporate a material formed as a by-product (MP) from the plasma and that is emitted to the evaporation surface. A method for removing a by-product material in or from a plasma radiation source of a lithographic apparatus includes evaporating a material which, in use, is emitted to that surface from the plasma.</p> |
申请公布号 |
EP2161725(B1) |
申请公布日期 |
2015.07.08 |
申请号 |
EP20090167126 |
申请日期 |
2009.08.27 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
LOOPSTRA, ERIK;SWINKELS, GERARDUS, HUBERTUS |
分类号 |
G21K1/06;G03F7/20;H05G2/00 |
主分类号 |
G21K1/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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