Multi charged particle beam writing apparatus and multi charged particle beam writing method

摘要

A multi charged particle beam writing apparatus according to an embodiment, includes a setting unit to set a second region such that more openings in remaining openings except for an opening through which the defective beam passes are included in the second region, a selection unit to select a mode from a first mode in which a pattern is written on a target object by using multiple beams having passed openings in the second region and a second mode in which multiple writing is performed while shifting a position by using at least one of remaining multiple beams in the state where the defective beam is controlled to be beam off and additional writing is performed for a position which was supposed to be written by the defective beam, and a writing processing control unit to control to write in the mode selected.

主权项

1. A multi charged particle beam writing apparatus comprising:
a stage configured to mount a target object thereon and be capable of moving continuously; an emission unit configured to emit a charged particle beam; an aperture member, in which a plurality of openings are formed, configured to form multiple beams by letting a first region including a whole of the plurality of openings be irradiated by the charged particle beam and letting parts of the charged particle beam pass through a corresponding opening of the plurality of openings respectively; a plurality of blankers configured to respectively perform blanking deflection of a corresponding beam in multiple beams having passed through the plurality of openings of the aperture member; a blanking aperture member configured to block each of beams which were deflected to be in a beam off state by the plurality of blankers; a detection unit configured to detect a defective beam in the multiple beams having passed through the plurality of openings of the aperture member; a setting unit configured to set a second region such that more openings in remaining openings except for an opening through which the defective beam passes in the plurality of openings of the aperture member are included in the second region; a selection unit configured to select a mode from a first mode in which a pattern is written on a target object by using multiple beams that have passed openings in the second region and a second mode in which multiple writing is performed while shifting a position by using at least one of remaining multiple beams in a state where the defective beam is controlled to be beam off and additional writing is performed for a position which was supposed to be written by the defective beam; and a writing processing control unit configured to control writing processing to write in the mode selected.