发明名称 |
Contact structure of semiconductor device |
摘要 |
The embodiments described above provide mechanisms of forming contact structures with low resistance. A strained material stack with multiple sub-layers is used to lower the Schottky barrier height (SBH) of the conductive layers underneath the contact structures. The strained material stack includes a SiGe main layer, a graded SiG layer, a GeB layer, a Ge layer, and a SiGe top layer. The GeB layer moves the Schottky barrier to an interface between GeB and a metal germanide, which greatly reduces the Schottky barrier height (SBH). The lower SBH, the Ge in the SiGe top layer forms metal germanide and high B concentration in the GeB layer help to reduce the resistance of the conductive layers underneath the contact structures. |
申请公布号 |
US9076762(B2) |
申请公布日期 |
2015.07.07 |
申请号 |
US201314093268 |
申请日期 |
2013.11.29 |
申请人 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
发明人 |
Tsai Chun Hsiung;Lin Yan-Ting |
分类号 |
H01L21/02;H01L29/417;H01L29/66;H01L29/78;H01L29/737 |
主分类号 |
H01L21/02 |
代理机构 |
Slater & Matsil, L.L.P. |
代理人 |
Slater & Matsil, L.L.P. |
主权项 |
1. A semiconductor device structure, comprising:
a gate structure formed over a surface of a semiconductor substrate; a recess neighboring the gate structure, wherein the recess is formed below the surface of the semiconductor substrate; a strained material stack filling the recess, wherein lattice constants of materials in the strained material stack are different from a lattice constant of the substrate, wherein the strain material stack comprises a boron-doped (B-doped) germanium (GeB) layer, a metal-Ge layer, and a metal-SiGe layer; and a contact structure formed in an inter-layer dielectric (ILD) layer, wherein bottom portion of the contact structure contacts the metal-SiGe layer. |
地址 |
Hsin-Chu TW |