| 摘要 |
<p>The present invention relates to an apparatus for processing inductively coupled plasma and a method for cleaning the same for generating plasma by induced electric field and processing a substrate with the plasma. The apparatus for processing inductively coupled plasma according to the present invention includes: a chamber; an antenna arranged on the outside of a dielectric window of the chamber; a lid which is arranged on the upper part of the chamber and receives the antenna; and variable capacitor units which are arranged on the upper part of the lid and controls the impedance of the antenna. The arrangement height of the variable capacitor units is less than or the same as the rotation radius of the lid. Therefore, the variable capacitor units are separated from a receiving space for receiving the antenna, so the rotation radius of the lid can be reduced according to the reduction of the height of the lid, and thereby a process space required for the cleaning process of the lead can be reduced.</p> |
