| 发明名称 | Aromatic sulfonium salt compound | ||
| 摘要 | Disclosed are a photo-acid generator having high developing properties, a cationic polymerization initiator having high curing properties, and a resist composition and a cationically polymerizable composition containing the photo-acid generator and the cationic polymerization initiator, respectively. Described are a noble aromatic sulfonium salt compound of general formula (I) and a photo-acid generator, a cationic polymerization initiator, a resist composition, and a cationically polymerizable composition containing the compound.;;In formula (I), R1 to R10 are each an optionally substituted C1-C18 alkyl, etc.; R11 to R17 are each an optionally substituted C1-C18 alkyl, etc.; R18 is an optionally substituted C1-C18 alkyl, etc.; and X131 is a monovalent anion. | ||
| 申请公布号 | US9073854(B2) | 申请公布日期 | 2015.07.07 |
| 申请号 | US201013389821 | 申请日期 | 2010.11.17 |
| 申请人 | ADEKA CORPORATION | 发明人 | Makabe Yoshie;Okuyama Yuta |
| 分类号 | C07D219/06;C08F2/50;G03F7/004;C08G59/68;C08L63/00 | 主分类号 | C07D219/06 |
| 代理机构 | Young & Thompson | 代理人 | Young & Thompson |
| 主权项 | 1. An aromatic sulfonium salt compound represented by general formula (II): wherein R21, R22, R22, R24, R28, R26, R27, R28, R28, and R30 each independently represent a hydrogen atom or a hydroxyl group; R31, R32, R33, R34, R35, R36, and R37 represent a hydrogen atom; R38 represents a methyl group; and X2− represents a monovalent anion; provided that at least one of R21 through R30 is a hydroxyl group. | ||
| 地址 | Tokyo JP | ||