MEMS DEVICE, AND MANUFACTURING METHOD FOR THE MEMS DEVICE

摘要

PROBLEM TO BE SOLVED: To provide an MEMS device having a positional deviation reduced between the device and a cavity.SOLUTION: An MEMS device comprises: a substrate having a cavity part; a mask layer having an opening above the substrate at a position overlapping the cavity part and formed of a material later in an etching rate than the substrate by a predetermined etching method; a buffer layer formed over the mask layer; a substrate formed over the buffer layer and at a position corresponding to the cavity part; and a device formed over the substrate.