| 摘要 |
PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition that exhibits excellent MEEF (mask error enhancement factor) performance, depth of focus, and exposure latitude and allows formation of a resist pattern excellent in LWR (line width roughness) performance, CDU (critical dimension uniformity) performance, resolution, and rectangularity of a cross-sectional shape.SOLUTION: The radiation-sensitive resin composition comprises an acid dissociable group-containing polymer and a radiation-sensitive acid generator. The polymer has a first structural unit, including a group represented by the formula (1) below. The radiation-sensitive acid generator contains an onium salt. In formula (1), L represents a divalent organic group having 1 to 20 carbon atoms; M represents a substituted or unsubstituted divalent hydrocarbon group having 1 to 20 carbon atoms, and L and M can be united to form a 3- to 20-membered monocyclic alicyclic structure together with the carbon atom bonded to L and M; and Rrepresents a monovalent organic group having 1 to 20 carbon atoms. |
