| 发明名称 |
PHOTORESIST STRIPPER COMPOSITION |
| 摘要 |
<p>The present invention relates to a photoresist stripper composition including compounds represented by chemical formula 1, an alkali-based compound, and a water soluble organic solvent. The photoresist stripper composition of the present invention does not remain on surfaces of a substrate and shows corrosion resistance effects to copper metal, has not electrical problems after processes are completed, and can prevent stains.</p> |
| 申请公布号 |
KR20150075521(A) |
申请公布日期 |
2015.07.06 |
| 申请号 |
KR20130163564 |
申请日期 |
2013.12.26 |
| 申请人 |
DONGWOO FINE-CHEM CO., LTD. |
发明人 |
LEE, YU JIN;KIM, SUNG SIK;SHIN, HYE RA |
| 分类号 |
G03F7/42;H01L21/027 |
主分类号 |
G03F7/42 |
| 代理机构 |
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