| 摘要 |
Provided is a substrate cleaning apparatus capable of sufficiently cleaning the whole part of a pen sponge and preventing removed particles from being reattached on the pen sponge. The substrate cleaning apparatus includes: a substrate holding unit (41) which holds and rotates a substrate (W); a sponge cleaning part (42) which is in contact with the surface of the substrate (W); a cleaning member (60) which is arranged near the substrate (W) which is held on the substrate holding unit (41); and a cleaning part moving device (51) which makes the sponge cleaning part (42) come into contact with the cleaning member (60). The cleaning member (60) has a cleaning surface in contact with the sponge cleaning part (42). The center (61a) of the cleaning surface (61) is higher than the outer side (61b) of the center. |
