发明名称 |
PHOTOSENSITIVE RESIN COMPOSITION |
摘要 |
<p>The present invention is to provide a photosensitive resin composition which can form a pattern having excellent adhesion to a substrate and water resistance; a method for forming the pattern using the photosensitive resin composition; a black matrix formed by using the photosensitive resin composition including a light shielding agent among the photosensitive resin composition as a colorant; and a display device having the black matrix. A silane coupling agent (D) of a specific structure is mixed to the photosensitive resin composition including an alkali soluble resin (A), a photopolymerizable monomer (B), and a photopolymerization initiator (C).</p> |
申请公布号 |
KR20150075376(A) |
申请公布日期 |
2015.07.03 |
申请号 |
KR20140186339 |
申请日期 |
2014.12.22 |
申请人 |
TOKYO OHKA KOGYO CO., LTD. |
发明人 |
ISHIKAWA TATSURO;KUROKO MAYUMI;SHIOTA DAI |
分类号 |
G03F7/075;G03F7/004;G03F7/027;G03F7/028 |
主分类号 |
G03F7/075 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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