发明名称 PHOTOSENSITIVE RESIN COMPOSITION
摘要 <p>The present invention is to provide a photosensitive resin composition which can form a pattern having excellent adhesion to a substrate and water resistance; a method for forming the pattern using the photosensitive resin composition; a black matrix formed by using the photosensitive resin composition including a light shielding agent among the photosensitive resin composition as a colorant; and a display device having the black matrix. A silane coupling agent (D) of a specific structure is mixed to the photosensitive resin composition including an alkali soluble resin (A), a photopolymerizable monomer (B), and a photopolymerization initiator (C).</p>
申请公布号 KR20150075376(A) 申请公布日期 2015.07.03
申请号 KR20140186339 申请日期 2014.12.22
申请人 TOKYO OHKA KOGYO CO., LTD. 发明人 ISHIKAWA TATSURO;KUROKO MAYUMI;SHIOTA DAI
分类号 G03F7/075;G03F7/004;G03F7/027;G03F7/028 主分类号 G03F7/075
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