| 发明名称 |
CHEMICAL MECHANICAL POLISHING LIQUID FOR POLISHING COBALT BARRIER LAYER |
| 摘要 |
<p>The present invention relates to a chemical mechanical polishing liquid for polishing a cobalt barrier layer, the chemical mechanical polishing liquid containing abrasive particles, an azole compound, a complexing agent, a polyalkoxide and an oxidizing agent. The polishing liquid of the present invention has a relatively strong capacity for controlling metal cobalt corrosion.</p> |
| 申请公布号 |
WO2015096630(A1) |
申请公布日期 |
2015.07.02 |
| 申请号 |
WO2014CN93682 |
申请日期 |
2014.12.12 |
| 申请人 |
ANJI MICROELECTRONICS (SHANGHAI) CO., LTD |
发明人 |
ZHANG, JIAN;JING, JIANFEN;CAI, XINYUAN;SONG, KAI;QIU, TENGFEI |
| 分类号 |
C09G1/02 |
主分类号 |
C09G1/02 |
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