发明名称 |
SUBSTRATE PROCESSING SYSTEM, SUBSTRATE TRANSPORT METHOD, AND COMPUTER STORAGE MEDIUM |
摘要 |
A substrate processing system has: a processing station having a plurality of processing devices; an interface station that transfers substrates between the processing station and a light exposure device provided with a plurality of light exposure stages outside of the system; a plurality of substrate inspection devices; a substrate transport mechanism that transports substrates between processing devices within the processing station and the substrate inspection devices; and a control device that controls the substrate transport mechanism so as to specify the light exposure stage used during exposure processing for a substrate out of the plurality of light exposure stages and carry out transport to a substrate inspection device associated in advance with the specified light exposure stage. |
申请公布号 |
WO2015098282(A1) |
申请公布日期 |
2015.07.02 |
申请号 |
WO2014JP78909 |
申请日期 |
2014.10.30 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
MORI, TAKUYA;TOMONO, MASARU |
分类号 |
H01L21/027;H01L21/677 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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