发明名称 SUBSTRATE PROCESSING SYSTEM, SUBSTRATE TRANSPORT METHOD, AND COMPUTER STORAGE MEDIUM
摘要 A substrate processing system has: a processing station having a plurality of processing devices; an interface station that transfers substrates between the processing station and a light exposure device provided with a plurality of light exposure stages outside of the system; a plurality of substrate inspection devices; a substrate transport mechanism that transports substrates between processing devices within the processing station and the substrate inspection devices; and a control device that controls the substrate transport mechanism so as to specify the light exposure stage used during exposure processing for a substrate out of the plurality of light exposure stages and carry out transport to a substrate inspection device associated in advance with the specified light exposure stage.
申请公布号 WO2015098282(A1) 申请公布日期 2015.07.02
申请号 WO2014JP78909 申请日期 2014.10.30
申请人 TOKYO ELECTRON LIMITED 发明人 MORI, TAKUYA;TOMONO, MASARU
分类号 H01L21/027;H01L21/677 主分类号 H01L21/027
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