| 发明名称 |
MECHANISMS OF ADJUSTABLE LASER BEAM FOR LASER SPIKE ANNEALING |
| 摘要 |
Mechanisms of adjustable laser beams for LSA (Laser Spike Annealing) are provided. A computing device receives input mask information relative to a silicon wafer, and analyzes the input mask information so as to generate a control signal. A laser generator generates a laser beam, and adjusts a beam length of the laser beam according to the control signal. Such mechanisms of the disclosure effectively eliminate the stitch effect on the silicon wafer and further increase the wafer yield. |
| 申请公布号 |
US2015187616(A1) |
申请公布日期 |
2015.07.02 |
| 申请号 |
US201314144657 |
申请日期 |
2013.12.31 |
| 申请人 |
Taiwan Semiconductor Manufacturing Co., Ltd. |
发明人 |
HUANG Po-Chun;TSENG Lee-Te;HUANG Wen-Chieh;YU Chi-Fu;CHEN Ming-Te |
| 分类号 |
H01L21/67;H01L21/324;H01L21/268 |
主分类号 |
H01L21/67 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. An apparatus for laser spike annealing (LSA), comprising:
a computing device, receiving input mask information, and analyzing the input mask information so as to generate a control signal; and a laser generator, generating a laser beam, and adjusting a beam length of the laser beam according to the control signal. |
| 地址 |
Hsin-Chu TW |
