发明名称 PROCESS OF PRODUCING POLYLACTIC ACID-BASED RESIN MICROPARTICLES AND POLYLACTIC ACID-BASED RESIN MICROPARTICLES
摘要 A process of producing polylactic acid-based resin microparticles includes a dissolving step that forms a system, which can cause phase separation into two phases of a solution phase mainly composed of polylactic acid-based resin (A) having an enthalpy of fusion of less than 5 J/g and a solution phase mainly composed of polymer (B) different from polylactic acid-based resin, by dissolving the polylactic acid-based resin (A) and the polymer (B) different from polylactic acid-based resin in an ether-based organic solvent (C); an emulsion-forming step that forms an emulsion by applying a shear force to the system; and a microparticle-forming step that precipitates polylactic acid-based resin microparticles by contacting the emulsion with a poor solvent which has lower solubility of the polylactic acid-based resin (A) than the ether-based organic solvent (C).
申请公布号 US2015183928(A1) 申请公布日期 2015.07.02
申请号 US201514659791 申请日期 2015.03.17
申请人 Toray Industries, Inc. 发明人 Takezaki Hiroshi;Kobayashi Hiroshi;Saito Makiko;Asano Itaru
分类号 C08G63/81 主分类号 C08G63/81
代理机构 代理人
主权项 1. A process of producing polylactic acid-based resin microparticles comprising: a dissolving step that forms a system, which can cause phase separation into two phases of a solution phase mainly composed of polylactic acid-based resin (A) having an enthalpy of fusion of less than 5 J/g and a solution phase mainly composed of polymer (B) different from polylactic acid-based resin, by dissolving said polylactic acid-based resin (A) and said polymer (B) different from polylactic acid-based resin in an ether-based organic solvent (C); an emulsion-forming step that forms an emulsion by applying a shear force to said system; and a microparticle-forming step that precipitates polylactic acid-based resin microparticles by contacting said emulsion with a poor solvent which has lower solubility of said polylactic acid-based resin (A) than said ether-based organic solvent (C).
地址 Tokyo JP