SUBSTRATE PROCESSING SYSTEM, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM

摘要

A substrate processing system includes a plurality of processing chambers accommodating substrates, a processing gas supply system configured to supply a processing gas sequentially into the plurality of processing chambers, a reactive gas supply system configured to supply an activated reactive gas sequentially into the plurality of processing chambers, a buffer tank installed at the processing gas supply system, and a control unit configured to control the processing gas supply system and the reactive gas supply system such that a time period of supplying the reactive gas into one of the plurality of processing chambers is equal to a sum of a time period of supplying the processing gas into the one of the plurality of processing chambers and a time period of supplying the processing gas into the buffer tank, and the processing gas and the reactive gas are alternately supplied into the plurality of processing chambers.

主权项

1. A substrate processing system comprising:
a plurality of processing chambers accommodating substrates; a processing gas supply system configured to supply a processing gas into the plurality of processing chambers in sequence; a reactive gas supply system configured to supply an activated reactive gas into the plurality of processing chambers in sequence; a buffer tank installed at the processing gas supply system; a mass flow controller installed at a downstream side of the buffer tank; and a controller configured to control the processing gas supply system, the reactive gas supply system and the mass flow controller to alternately supply the processing gas and the reactive gas into each of the plurality of processing chambers in a manner that a time period of supplying the reactive gas into one of the plurality of processing chambers is equal to a sum of a time period of supplying the processing gas into the one of the plurality of processing chambers and a time period of supplying the processing gas into the buffer tank.