| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a radiation-sensitive composition satisfying basic characteristics such as sensitivity, having an excellent lithographic performance with LWR or the like defined as an index, and capable of forming a pattern having a favorable rectangular pattern shape without leaving residues on a pattern skirt part. <P>SOLUTION: The radiation-sensitive composition includes: [A] a polymer component having a repeating unit (I) represented by the following formula (1); and [B] a radiation-sensitive acid-generating body. In the following formula (1), it is preferable that either of R<SP POS="POST">5</SP>and R<SP POS="POST">6</SP>, and R<SP POS="POST">4</SP>are mutually bonded to form a ring structure having a carbon number of 5 to 20. <P>COPYRIGHT: (C)2013,JPO&INPIT |
