发明名称 PRODUCTION PROCESS MONITORING SYSTEM AND CONTROL METHOD THEREOF
摘要 <p>Provided is a production process monitoring system, including a first sensor (12), a plurality of second sensors (16), a reference control unit (14) and at least one distribution controller (22). The reference control unit can output to a reference reactor (110) a first control amount (C 1 ) that can control a first parameter in the reference reactor. The distribution controller can output a distribution control amount (C D ) to a distribution reactor (120). The present invention also relates to a monitoring system control method. The production process monitoring system and the control method thereof avoid installing identical sensors on each reactor of the entire monitoring system, thereby greatly reducing the cost of the monitoring system during the production process, and also reducing the maintenance and operation costs of the entire system due to a reduced number of sensors. Also provided is a monitoring system control method.</p>
申请公布号 EP2772529(A4) 申请公布日期 2015.07.01
申请号 EP20110874524 申请日期 2011.10.28
申请人 SIEMENS AKTIENGESELLSCHAFT 发明人 FAN, SHUNJIE;MENG, XIANTAO
分类号 C12M1/34;C12M1/00 主分类号 C12M1/34
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