处理杯洗净方法，基板处理方法及基板处理装置;TREATMENT CUP CLEANING METHOD, SUBSTRATE TREATMENT METHOD, AND SUBSTRATE TREATMENT APPARATUS

摘要

处理杯洗净方法系包含有以下之步骤：旋转作动步骤，其在将基板加以保持在基板旋转单元之状态下，使上述基板旋转单元之旋转动作产生作动；洗净液供给步骤，其与上述旋转作动步骤同步而加以执行，藉由将洗净液供给至上述基板之上面及下面的双方，使自上述基板之周缘部所飞散之洗净液，着液于上述处理杯之上述内壁，而将洗净液供给至上述处理杯之上述内壁；及飞散方向变更步骤，其与上述旋转作动步骤及上述洗净液供给步骤同步，使自上述基板之周缘部所飞散之洗净液的方向产生变更。; a cleaning liguid supplying step of supplying a cleaning liquid to an upper surface and a lower surface of the substrate and causing the cleaning liquid to scatter from a peripheral edge of the substrate to be applied to an inner wall of a treatment cup in the rotating step, whereby the cleaning liquid is supplied to the inner wall of the treatment cup; and a scattering direction changing step of changing a cleaning liquid scattering direction in which the cleaning liquid scatters from the peripheral edge of the substrate in the rotating step and the cleaning liquid supplying step.