COMPOSITION FOR FORMING ANTISTATIC FILM AND OLIGOMER COMPOUND

摘要

There is provided a composition for forming an antistatic film that has a superior coating performance on the surface of a resist film and forms antistatic film capable of protecting a resist film from being charged. A composition for forming an antistatic film, comprising: an oligomer compound of Formula (1A):
(where R 1 is a hydrogen atom or a group of Formula (2), each of R 2 and R 3 is independently a hydrogen atom, a group of Formula (3), or a group of Formula (4), at least one of the plurality of Rs is a sulfo group, a and b are positive integers satisfying 2 ‰¤ (a + b) ‰¤ 6; and each of a plurality of xs is independently an integer from 0 to 4):
(where n is an integer satisfying 1 ‰¤ n < (a + b + 4); a, b, a plurality of Rs, and x are the same as those in Formula (1A); and each of a plurality of ys is independently an integer from 0 to 5); and water.