A PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION SYSTEM

摘要

A PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION SYSTEM (100) FOR SYNTHESIZING CARBON NANO-STRUCTURES COMPRISING A CHAMBER (101), ELECTRODES CONSIST OF ANODE (107) AND CATHODE (108) RESIDED IN SAID CHAMBER (101) AND A MEANS OF DIRECT CURRENT (102) APPLIED ON BOTH ELECTRODES TO GENERATE A GLOW DISCHARGE OF CARBON-CONTAINING GAS (104) DEPOSITED ON A SUBSTRATE-SUPPORTED CATALYST (103) SITUATED IN SAID CHAMBER (101) WHEREIN SAID CARBON-CONTAINING GAS (104) IS SUPPLIED WITH A CARRIER GAS (105) CHARACTERIZED IN THAT THE ENTRY POINT (121) OF SAID CARBON-CONTAINING GAS (104) OVER A SHOWER GAS RING SUPPLY (122) IS BETWEEN SAID ANODE (107) AND SAID CATHODE (108) TO MAINTAIN HIGH DENSITY PLASMA IN SAID CHAMBER (101) WHEREBY PRODUCING A GREATER AMOUNT OF CARBON NANO-STRUCTURES. THE MOST ILLUSTRATIVE DRAWING: