| 摘要 |
<p>A semiconductor substrate processing apparatus processing a semiconductor substrate includes a shower head, wherein a shower head module transfers a process gas from a process gas source to a processing zone of the semiconductor substrate processing apparatus through a face plate including gas paths through a face plate. The shower head module comprises a gas transfer pipe fluidly connected with a cavity on lower end of the shower head module; a baffle arrangement located in the gas transfer pipe and the cavity; and a blocker plate arranged under the baffle arrangement in the cavity. The baffle arrangement comprises baffles dividing the process gas flowing through the gas transfer pipe into a center flow stream, an inner annular flow stream, and an outer annular flow stream, wherein the center flow stream gets out of the baffle arrangement after converting direction by the blocker plate, and heads to radial outer side on the center part of the face plate, the inner annular flow stream gets out of the baffle arrangement on an inner annular area of the face plate, and the outer annular flow stream gets out of the baffle arrangement on an outer annular area of the face plate.</p> |
