发明名称 THIN FILM DEPOSITION APPARATUS
摘要 A thin film deposition apparatus includes: a deposition source that discharges a deposition material; a deposition source nozzle unit disposed at a side of the deposition source and including a plurality of deposition source nozzles arranged in a first direction; a patterning slit sheet disposed opposite to the deposition source nozzle unit and including a plurality of patterning slits arranged in the first direction; a position detection member that detects a relative position of the substrate to the patterning slit sheet; and an alignment control member that controls a relative position of the patterning slit sheet to the substrate by using the relative position of the substrate detected by the position detection member, wherein the thin film deposition apparatus and the substrate are separated from each other, and the thin film deposition apparatus and the substrate are moved relative to each other.
申请公布号 US2015176131(A1) 申请公布日期 2015.06.25
申请号 US201514642360 申请日期 2015.03.09
申请人 SAMSUNG DISPLAY CO., LTD. 发明人 Hong Jong-Won;Chang Seok-Rak;JO Chang-Mog;Choi Young-Mook;Ryu Jae-Kwang
分类号 C23C16/52;C23C16/04 主分类号 C23C16/52
代理机构 代理人
主权项 1. A thin film deposition apparatus to form a thin film on a substrate, the apparatus comprising: a deposition source that discharges a deposition material; a deposition source nozzle unit disposed at a side of the deposition source and including a plurality of deposition source nozzles arranged in a first direction; a patterning slit sheet disposed opposite to and spaced apart from the deposition source nozzle unit and including a plurality of patterning slits arranged in the first direction; a barrier plate assembly comprising a plurality of barrier plates that are disposed between the deposition source nozzle unit and the patterning slit sheet in the first direction, and that partition a space between the deposition source nozzle unit and the patterning slit sheet into a plurality of sub-deposition spaces; a position detection member that detects a relative position of the substrate to the patterning slit sheet; and an alignment control member that controls a relative position of the patterning slit sheet to the substrate by using the relative position of the substrate detected by the position detection member, wherein the thin film deposition apparatus and the substrate are spaced apart from each other, and the thin film deposition apparatus and the substrate are moved relative to each other.
地址 Yongin-City KR