发明名称 SEMICONDUCTOR DEVICE MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor device manufacturing method which can reduce the possibility of damages on a laminate of semiconductor substrates when dividing the laminate. ! SOLUTION: A semiconductor device manufacturing method comprises: a process of preparing semiconductor substrates 11 and a multilayer substrate; a process of performing division processing between regions where semiconductor chips are formed, respectively of a principal surface of the multilayer substrate; a process of preparing a support medium and temporarily fixing the multilayer substrate with the principal surface facing the support medium side; a process of thinning the multilayer substrate to create a state where a plurality of semiconductor chips are arranged on the support medium after division; a process of fastening back faces of the plurality of semiconductor chips 110 arranged on the support medium to a principal surface of the semiconductor substrate; a process of removing the support medium; a process
申请公布号 JP2015119109(A) 申请公布日期 2015.06.25
申请号 JP20130263012 申请日期 2013.12.19
申请人 TOKYO INSTITUTE OF TECHNOLOGY 发明人 OBA TAKAYUKI ; KODAMA SHOICHI ; ARAI KAZUNAO
分类号 H01L25/065;H01L21/301;H01L25/07;H01L25/18 主分类号 H01L25/065
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