发明名称 |
SEMICONDUCTOR DEVICE MANUFACTURING METHOD |
摘要 |
PROBLEM TO BE SOLVED: To provide a semiconductor device manufacturing method which can reduce the possibility of damages on a laminate of semiconductor substrates when dividing the laminate. ! SOLUTION: A semiconductor device manufacturing method comprises: a process of preparing semiconductor substrates 11 and a multilayer substrate; a process of performing division processing between regions where semiconductor chips are formed, respectively of a principal surface of the multilayer substrate; a process of preparing a support medium and temporarily fixing the multilayer substrate with the principal surface facing the support medium side; a process of thinning the multilayer substrate to create a state where a plurality of semiconductor chips are arranged on the support medium after division; a process of fastening back faces of the plurality of semiconductor chips 110 arranged on the support medium to a principal surface of the semiconductor substrate; a process of removing the support medium; a process |
申请公布号 |
JP2015119109(A) |
申请公布日期 |
2015.06.25 |
申请号 |
JP20130263012 |
申请日期 |
2013.12.19 |
申请人 |
TOKYO INSTITUTE OF TECHNOLOGY |
发明人 |
OBA TAKAYUKI ; KODAMA SHOICHI ; ARAI KAZUNAO |
分类号 |
H01L25/065;H01L21/301;H01L25/07;H01L25/18 |
主分类号 |
H01L25/065 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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