TOUCH PANEL AND METHOD OF MANUFACTURING TOUCH PANEL

摘要

A method of manufacturing a touch panel with a reduced number of steps is provided. A method of manufacturing a touch panel (1) includes the steps of; patterning a first transparent conductive film to form a layer containing parts of sensor electrodes (14), (15); patterning a highly-conductive film having a lower electric resistance than the first transparent conductive film to form a layer containing lines (171); patterning a light-shielding film to form a layer containing a light-shielding portion (11); and, after forming the layer containing the light-shielding portion (11), pattering an insulating film to form a layer containing interlayer insulating films (121) and planarizing film (122). The step of patterning a light-shielding film and the step of patterning an insulating film are performed between the step of pattering a first transparent conductive film and the step of patterning a highly-conductive film.

主权项

1. A method of manufacturing a touch panel including:
sensor electrodes including a first electrode and a second electrode crossing each other in a plan view; an interlayer insulating film insulating the first electrode and the second electrode from each other; lines each electrically connected with one of the sensor electrodes; a light-shielding portion overlying the lines in a plan view; and a planarizing film covering the light-shielding portion, the method comprising the steps of: patterning a first transparent conductive film to form a layer containing parts of the sensor electrodes; patterning a highly-conductive film having a lower electric resistance than the first transparent conductive film to form a layer containing the lines; patterning a light-shielding film to form a layer containing the light-shielding portion; and, after forming the layer containing the light-shielding portion, pattering an insulating film to form a layer containing the interlayer insulating film and the planarizing film, wherein the step of patterning a light-shielding film and the step of patterning an insulating film are performed between the step of pattering a first transparent conductive film and the step of patterning a highly-conductive film.