发明名称 PROCESSING METHOD FOR WAFER
摘要 PROBLEM TO BE SOLVED: To provide a processing method for a wafer, by which the possibility of failure in die bonding step can be reduced. ! SOLUTION: A processing method for a wafer in which a device is formed in each of areas formed on the surface of the wafer and separated by a plurality of dividing lines intersecting one another comprises: a tape sticking step in which a dicing tape is stuck to the back of a wafer via a die bonding film; a holding step in which, after the tape sticking step, the wafer is held on a chuck table via the dicing tape; a cutting step in which the wafer held on the chuck table is cut from its surface to the dicing tape by a cutting blade, and separating grooves are formed for separating the wafer and the die bonding film by cutting them along the dividing lines and a heat emitting step in which after the cutting step, heat is applied along the cutting grooves and thereby a whisker-like burr of the die bonding film caused in the cutting step is melted to the minimum. ! COPYRIG
申请公布号 JP2015119068(A) 申请公布日期 2015.06.25
申请号 JP20130262197 申请日期 2013.12.19
申请人 DISCO ABRASIVE SYST LTD 发明人 YAMADA HIROTERU
分类号 H01L21/301 主分类号 H01L21/301
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